Behaviour of Monolayers Tetraether Lipids Caldarchaeol-PO4 on the Modification of the Solid Surface-supported Wafer Silicon to Amino-silanised: Comparison of Analysis Studies between Langmuir-Blodgett Monolayers with Self-Assembled Monolayers

Vidawati, Sri and Bakowsky, Udo and Rothe, Ulrich (2023) Behaviour of Monolayers Tetraether Lipids Caldarchaeol-PO4 on the Modification of the Solid Surface-supported Wafer Silicon to Amino-silanised: Comparison of Analysis Studies between Langmuir-Blodgett Monolayers with Self-Assembled Monolayers. In: Research Aspects in Chemical and Materials Sciences Vol. 6. B P International, pp. 136-147. ISBN 978-81-19039-33-3

Full text not available from this repository.

Abstract

This study analyzed the behaviour of organization molecular chemically modified tetraether lipids caldarchaeol-PO4 on the modification of the solid surface-supported wafer silicon to amino-silanised using Langmuir-Blodgett films, Self Assembling Monolayers (SAMs), ellipsometry, and atomic force microscopy (AFM). On the silicon wafer with an amino-silaned surface, the monolayers of caldarchaeol-PO4 remained stable. By using the Langmuir-Blodgett technique and SAMs, the organisations of molecular monolayers of caldarchaeol-PO4 have been examined. In the Langmuir-Blodgett procedure, surface pressure is carried out in monolayers of more flat, inhomogeneous caldarchaeol-PO4. A large flat domain is displayed by another way of monolayers caldarchaeol-PO4 using SAMs. Monolayers caldarchaeol-PO4 by the Langmuir-Blodgett method appears to be stable and chemically resistant after washing with organic solvent and an additional treatment ultrasonification with various lipid thicknesses of about 2 nm to 6 nm. Conversely monolayers caldarchaeol-PO4 by SAMs appear less than monolayers caldarchaeol-PO4 by the Langmuir-Blodgett method, thicknesses varying from 1 nm to 3 nm.

Item Type: Book Section
Subjects: STM Open Academic > Chemical Science
Depositing User: Unnamed user with email admin@eprint.stmopenacademic.com
Date Deposited: 03 Oct 2023 04:59
Last Modified: 03 Oct 2023 04:59
URI: http://publish.sub7journal.com/id/eprint/1150

Actions (login required)

View Item
View Item